HBO (Mikrolithografie)

HBO Mikrolithographielampen für ASML i-line Systeme
Anwendungsgebiete
  • Microlithography

HBO Mikrolithographielampen für ASML i-line Systeme

Produkteigenschaften
  • High spectral intensity with peak irradiance at 365nm wavelength, making it ideal for microlithography
  • Designed for long lasting performance
  • Designed for long lasting performance
  • Qualified with ASML

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HBO Mikrolithografie-Lampen für Canon i-line Systeme
Anwendungsgebiete
  • Microlithography

HBO Mikrolithografie-Lampen für Canon i-line Systeme

Produkteigenschaften
  • High spectral intensity with peak irradiance at 365nm wavelength, making it ideal for microlithography
  • Designed for long lasting performance
  • Designed for long lasting performance
  • Qualified with Canon

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HBO Mikrolithographie-Lampen für Nikon i-line Systeme
Anwendungsgebiete
  • Microlithography

HBO Mikrolithographie-Lampen für Nikon i-line Systeme

Produkteigenschaften
  • High spectral intensity with peak irradiance at 365nm wavelength, making it ideal for microlithography
  • Designed for long lasting performance
  • Designed for long lasting performance
  • Qualified with Nikon

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HBO Mikrolithographie-Lampen für Canon FPD-Systeme
Anwendungsgebiete
  • Microlithography

HBO Mikrolithographie-Lampen für Canon FPD-Systeme

Produkteigenschaften
  • High spectral intensity with peak irradiance at 365nm wavelength, making it ideal for microlithography
  • Designed for long lasting performance
  • Designed for long lasting performance
  • Qualified with Canon

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HBO Mikrolithographielampen für Süss Systems
Anwendungsgebiete
  • Microlithography

HBO Mikrolithographielampen für Süss Systems

Produkteigenschaften
  • High spectral intensity with peak irradiance at 365nm wavelength, making it ideal for microlithography
  • Designed for long lasting performance
  • Designed for long lasting performance
  • Qualified with Süss

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HBO Mikrolithographie-Lampen für andere Systeme
Anwendungsgebiete
  • Microlithography

HBO Mikrolithographie-Lampen für andere Systeme

Produkteigenschaften
  • High spectral intensity with peak irradiance at 365nm wavelength, making it ideal for microlithography
  • Designed for long lasting performance
  • Designed for long lasting performance
  • Qualified with major microlithography equipment manufacturers

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